F. Liu, Y. Yao, J.A. van Kan
Nulcear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Nanoimprint lithography (NIL) is a promising technology that can fabricate structures with high resolution and high throughput. To replicate patterns through NIL, a high quality master mold is needed. A UV patternable inorganic–organic hybrid polymer, OrmoStamp with high resolution is promising for the fabrication of NIL molds. Here, OrmoStamp molds were fabricated by proton beam writing (PBW) in resist followed by OrmoStamp casting. In this paper, different resists (HSQ, PMMA, SU-8 and SML) were evaluated by PBW for OrmoStamp mold fabrication.Read more...