EM Resist provides customers with a wide range of electron beam resists. Ranging from our high performance SML Resists to industry standard PMMA resists.
Positive Tone Electron Beam Resists
SML Resist is a high resolution, high aspect ratio positive tone electron beam resist. It has excellent adhesion properties and great dry etch resistance. SML can be used for MEMS, Zones Plates, photonics and many other nanofabrication applications.
PMMA Resist is the industry standard positive tone resist for electron beam lithography. We offer PMMA in a wide range of molecular weights and thicknesses. Take a look at our product page to see what we have available. If you don’t find what you are looking for let us know.
Negative Tone Electron Beam Resists
HSQ Resist is a high resolution negative tone resist. Due to its Si base, it’s used in many applications that require high etch resistance. We supply HSQ pre-mixed or in kit form.