SU-8 Photoresist

SU-8 Series Photoresist

EM Resist offers a range of classic SU-8 photoresist products ideal for semiconductor applications. Our products are available under various forms and in a range of thicknesses.

If you have any application specific questions please don’t hesitate to contact us.

Quotation Request

Below is a table of our GM10XX products. If you have any specific requirements, please contact us for more information.

ProductFilm Thickness RangeCoating Options
GM1010< 0.2 μmSpray Coat
GM10200.2 - 0.5 μmSpin, Spray, Inkjet
GM10300.5 - 1.2 μmSpin, Spray, Inkjet
GM10400.9 - 3.2 μmSpin, Spray, Inkjet
GM10503 - 8 μmSpin, Inkjet
GM10602 - 27 μmSpin, Inkjet
GM107015 - 200 μmSpin, Inkjet
GM1075100 - 400 μmSpin, Inkjet

Minimum order quantity is 250mL

A typical SU-8 process consists of the following steps:

  • Substrate preparation
  • Spin coating
  • Relaxation time to improve the surface uniformity
  • Soft-bake
  • Exposure to initiate cross-linking
  • Post exposure bake
  • Development
  • Rinse & Dry
  • Optional hard bake

For individual processing conditions for each product, please contact us for the relevant datasheets.