SU-8 Series Photoresist
EM Resist offers a range of classic SU-8 photoresist products ideal for semiconductor applications. Our products are available under various forms and in a range of thicknesses.
If you have any application specific questions please don’t hesitate to contact us.
Below is a table of our GM10XX products. If you have any specific requirements, please contact us for more information.
|Product||Film Thickness Range||Coating Options|
|GM1010||< 0.2 μm||Spray Coat|
|GM1020||0.2 - 0.5 μm||Spin, Spray, Inkjet|
|GM1030||0.5 - 1.2 μm||Spin, Spray, Inkjet|
|GM1040||0.9 - 3.2 μm||Spin, Spray, Inkjet|
|GM1050||3 - 8 μm||Spin, Inkjet|
|GM1060||2 - 27 μm||Spin, Inkjet|
|GM1070||15 - 200 μm||Spin, Inkjet|
|GM1075||100 - 400 μm||Spin, Inkjet|
Minimum order quantity is 250mL
A typical SU-8 process consists of the following steps:
- Substrate preparation
- Spin coating
- Relaxation time to improve the surface uniformity
- Exposure to initiate cross-linking
- Post exposure bake
- Rinse & Dry
- Optional hard bake
For individual processing conditions for each product, please contact us for the relevant datasheets.