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EM Resist Ltd is a leading edge Nanotechnology company that provides state of the art electron beam resists.
Current state of the art electron beam resists such as PMMA can achieve aspect ratios of 4:1 and 12.5:1 at acceleration voltages of 25KV and 100KV respectively.
A new electron beam resist called SML resist has been developed at the University of Manchester to obtain ultra high resolution while maintaining an ultra large aspect ratio for post processing.