PMMA Resist

PMMA Resist

PMMA Resist is the industry standard electron beam resist used across academia and industry for high resolution features and lift-off applications. It can also be used in nanoimprint applications as well as other fab and R&D processes such as graphene flake transfer.

If you have any application specific questions please don’t hesitate to contact us.

If you are looking for a high resolution resist with good etch resistance, take a look at our SML Resist.

Quotation Request

Below is a table of our available PMMA products. If you have any specific requirements, please contact us for more information.

Molecular WeightDilutions
950KA2 - A10
495KA2 - A10
120KA2 - A12
35KA2 - A12

Minimum order quantity is 250mL

Below are our suggested processing conditions for PMMA:

  • Casing solvent: Anisole
  • Pre-bake: 180°C for 2 minutes
  • Exposure: 100-300 μC/cm2 @ 30kV
  • Developer: MIBK:IPA (1:3) for 30s. All other PMMA developers will also work with SML resist.
  • Stopper: IPA for 15s
  • Remover: Acetone

The shelf life of the resist is 12 months. Store at room temperature away from direct sunlight.

PMMA 950K – Spin Curves

PMMA 950K Spin Curve

PMMA 495K – Spin Curves

PMMA 495K Spin Curves

Spin curves are accurate to +/-10% – results may vary based on equipment and exact process used.

For high resolution spin curves, please download the spin curves PDF here.