SU-8 (GMXX Series) Photoresist

EM Resist offers a range of classic SU-8 photoresist products ideal for semiconductor applications. Our products are available under various forms and in a range of thicknesses.

If you have any application specific questions please don’t hesitate to contact us.

Quotation Request

Below is a table of our GM10XX products. If you have any specific requirements, please contact us for more information.

Product Film Thickness Range Coating Options
GM1010 < 0.2 μm Spray Coat
GM1020 0.2 - 0.5 μm Spin, Spray, Inkjet
GM1030 0.5 - 1.2 μm Spin, Spray, Inkjet
GM1040 0.9 - 3.2 μm Spin, Spray, Inkjet
GM1050 3 - 8 μm Spin, Inkjet
GM1060 2 - 27 μm Spin, Inkjet
GM1070 15 - 200 μm Spin, Inkjet
GM1075 100 - 400 μm Spin, Inkjet

Minimum order quantity is 250mL



A typical SU-8 process consists of the following steps:

  • Substrate preparation
  • Spin coating
  • Relaxation time to improve the surface uniformity
  • Soft-bake
  • Exposure to initiate cross-linking
  • Post exposure bake
  • Development
  • Rinse & Dry
  • Optional hard bake

For individual processing conditions for each product, please contact us for the relevant datasheets.