PMMA & Copolymer Resists

PMMA Resist is the industry standard positive tone electron beam resist used across academia and industry for high resolution features and lift-off applications. It can also be used in nanoimprint applications as well as other fab and R&D processes such as graphene flake transfer. P(MMA-MAA) copolymer resists can be used in conjunction with PMMA for bilayer resist applications such as T-gates. It can also be used on its own as a high sensitivity positive tone resist.

If you have any application specific questions please don’t hesitate to contact us.

If you are looking for a high resolution resist with good etch resistance, take a look at our SML Resist.

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