PMMA Resist
PMMA Resist is the industry standard electron beam resist used across academia and industry for high resolution features and lift-off applications. It can also be used in nanoimprint applications as well as other fab and R&D processes such as graphene flake transfer.
If you have any application specific questions please don’t hesitate to contact us.
If you are looking for a high resolution resist with good etch resistance, take a look at our SML Resist.
Below is a table of our available PMMA products. If you have any specific requirements, please contact us for more information.
| Molecular Weight | Dilutions |
|---|---|
| 950K | A2 - A10 |
| 495K | A2 - A10 |
| 120K | A2 - A12 |
| 35K | A2 - A12 |
Minimum order quantity is 250mL
Below are our suggested processing conditions for PMMA:
- Casing solvent: Anisole
- Pre-bake: 180°C for 2 minutes
- Exposure: 100-300 μC/cm2 @ 30kV
- Developer: MIBK:IPA (1:3) for 30s. All other PMMA developers will also work with SML resist.
- Stopper: IPA for 15s
- Remover: Acetone
The shelf life of the resist is 12 months. Store at room temperature away from direct sunlight.
PMMA 950K – Spin Curves
PMMA 495K – Spin Curves
Spin curves are accurate to +/-10% – results may vary based on equipment and exact process used.
For high resolution spin curves, please download the spin curves PDF here.