PMMA Resist

PMMA Resist

PMMA Resist is the industry standard electron beam resist used across academia and industry for high resolution features and lift-off applications. It can also be used in nanoimprint applications as well as other fab and R&D processes such as graphene flake transfer.

If you have any application specific questions please don’t hesitate to contact us.

If you are looking for a high resolution resist with good etch resistance, take a look at our SML Resist.

Quotation Request

Below is a table of our available PMMA products. If you have any specific requirements, please contact us for more information.

Molecular WeightDilutions
950KA2 - A10
495KA2 - A10
120KA2 - A12
35KA2 - A12

Minimum order quantity is 250mL

Below are our suggested processing conditions for PMMA:

  • Casing solvent: Anisole
  • Pre-bake: 180°C for 2 minutes
  • Exposure: 100-300 μC/cm2 @ 30kV
  • Developer: MIBK:IPA (1:3) for 30s. All other PMMA developers will also work with SML resist.
  • Stopper: IPA for 15s
  • Remover: Acetone

The shelf life of the resist is 12 months. Store at room temperature away from direct sunlight.

PMMA 950K – Spin Curves

PMMA 950K Spin Curve

PMMA 495K – Spin Curves

PMMA 495K Spin Curves

Spin curves are accurate to +/-10% – results may vary based on equipment and exact process used.

For high resolution spin curves, please download the spin curves PDF here.

EM Resist Ltd.

Media House
Macclesfield
SK10 4NL

Tel: +44 (0) 1625 813723
info@emresist.com